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Characterization of As-deposited and Annealing SiN Films Deposited by Plasma Enhanced Chemical Vapour Deposition
更新时间：2023-12-11
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    • Characterization of As-deposited and Annealing SiN Films Deposited by Plasma Enhanced Chemical Vapour Deposition

    • Acta Scientiarum Naturalium Universitatis SunYatseni   Vol. 42, Issue S1, Pages: 75-77(2003)

    • Published：2003，

      Published Online：25 December 2003，

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  • LI Yan, LI Xu-dong, XU Ying, et al. Characterization of As-deposited and Annealing SiN Films Deposited by Plasma Enhanced Chemical Vapour Deposition. [J]. Acta Scientiarum Naturalium Universitatis SunYatseni 42(S1):75-77(2003) DOI：

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